Creo Simulate > Getting Started with Creo Simulate > Planning and Modeling Considerations > Using Effective Modeling Techniques > Using Datum Features
  
Using Datum Features
Using datum features such as datum points, curves, surfaces, and axes can help you simulate a variety of effects and apply a number of different types of modeling entities. For example, you need datum points to create such entities as point loads, local measures, mesh controls, and certain idealizations such as springs, masses, and spot welds. You use datum curves and surfaces to create surface and volume regions, enabling you to isolate loads and constraints, add loads and constraints to free portions of merged surfaces, and so forth.
You can create datum features for your part in either Creo Parametric or Creo Simulate. There are differences implicit in where you create these features:
Creo Parametric—If you create the datum features in Creo Parametric, the datum features will be visible on your part in both Creo Parametric and Creo Simulate. You can also take advantage of certain Creo Parametric part building techniques not available with Creo Simulate datum geometry creation, such as patterning and mirroring.
However, you may find that adding these features in Creo Parametric creates visual clutter that may prove distracting when you use your model for other purposes, such as manufacturing or documentation. If this is the case, consider creating the datum features within Creo Simulate instead, as they will not be visible when you return to Creo Parametric.
Creo Simulate—Datum features created within Creo Simulate are known as simulation features. You can create simulation features at any time during your Creo Simulate session—before you add modeling entities or as you define those modeling entities. Simulation features are only available to you during your Creo Simulate sessions unless you promote them. The software turns off these features each time you return to Creo Parametric.
Return to Simulation Modeling Techniques and Prerequisites.